Selective Laser Etching of Glass
Lumos’s innovative GHz burst pulsed femtosecond lasers and femtosecond pulsed lasers are rewriting the narrative in selective laser etching (SLE) of these materials. These lasers, with their ultra-short pulse durations and lower energy pulses provide a high level of control and precision, enabling the selective etching with minimal thermal impact and material deformation. Notably, the GHz burst femtosecond lasers offer greater parameter flexibility compared to standard femtosecond lasers in the market, thanks to the additional burst parameters. This, in turn, opens up new possibilities for optimization in selective laser etching, where fine-tuning the process parameters is essential for achieving desired outcomes. Recent literature indicates that the enhanced parameter flexibility can lead to better selectivity in etching processes, which is crucial for applications demanding stringent specifications.
By leveraging Lumos’s femtosecond laser technology, industries can benefit from:
- Exceptional Precision: The ultra-short pulse durations ensure a high degree of accuracy, allowing for the creation of complex geometries and fine features in a variety of materials including glass, glass ceramics, sapphire, quartz, and precious stones.
- Improved Selectivity: The enhanced parameter flexibility of GHz burst mode facilitates better selectivity, crucial for precise etching requirements.
- Three-Dimensional Structuring: Unleash the capability to create intricate three-dimensional structures within these materials, which was unattainable with other techniques, opening up new avenues in design and functionality.
Engage with us to discover how our laser systems can revolutionize your material modification projects, delivering unmatched precision, improved selectivity, and three-dimensional structuring capabilities.
- Hnatovsky, Cyril, et al. “Fabrication of microchannels in glass using focused femtosecond laser radiation and selective chemical etching.” Applied Physics A 84 (2006): 47-61.
- Hermans, Martin, Jens Gottmann, and Frank Riedel. “Selective, Laser-Induced Etching of Fused Silica at High Scan-Speeds Using KOH.” Journal of Laser Micro/Nanoengineering 9.2 (2014).
- Butkutė, Agnė, and Linas Jonušauskas. “3D manufacturing of glass microstructures using femtosecond laser.” Micromachines12.5 (2021): 499.